This vacuum chamber weighs more than 7 elephants combined. 😮Weighing around 75 tons and measuring 5 m x 10 m, the vacuum chamber at ZEISS #Semiconductor Manufacturing Technology enables the extremely precise measurement of the mirrors for the next generation of lithography, which uses extreme ultraviolet light: High-NA EUV. During production, the mirror surface must be measured several times in the sub-nanometer range.🔍The effort is enormous, but this is the only way to achieve the necessary measurement accuracy. #ZEISS #Semiconductor #CleanRooms #Microchips #Digitalization